The DIGISEL in-situ laser ellipsometer provides a rapid, accurate
quality control solution for the deposition and etch of films in-situ.
The DIGISEL takes advantage of an advanced optical design that ensures
accurate real-time calculation of the thickness and refractive index
of single layer films in-situ.
The compact ellipsometric heads are easily mounted onto CVD, electron-beam,
MBE, sputtering as well as any other chamber that has an entrance
and exit window for the measuring beam.
The DIGISEL is simple to operate and adaptable to many types of
processes, and is the tool of choice for simplifying everyday process
characterization and development for demanding research and industrial
quality control applications.
Key Applications
The DIGISEL in-situ ellipsometer is routinely used for:
Due to its very high sensitivity in-situ ellipsometry is ideal for
investigating any change in surface properties, such as oxide formation,
chemisorption, surface contamination or protein adsorption very
accurately, in real-time.
Inclusion of the DIGISEL as part of a process monitoring system
supplies precise thin film process information for a competitive
edge in a vast array of applications. The DIGISEL may be included
with the MultiCPM process
metrology platform, and used together with the DIGILEM interferometric
end point detection system,
and DIGICPM optical
emission system.
