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 Thin Film Metrology Product List


Ellipsometry is an optical non destructive technique allowing the accurate characterization of thin films, surface and interface. It is capable of determining layer thickness from 1 Å to tens of microns, optical constants, composition, anisotropy, crystallinity and uniformity.

Spectroscopic Ellipsometers

Unique technologies providing the most sensitive, accurate measurement along with advanced thin film characterization capabilities.

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Laser Ellipsometers

Cost effective, upgradeable solution for simple metrology applications.

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In-Situ Ellipsometers

High precision, high speed monitoring and control of thin film deposition or etch processes.

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Fully Automated Ellipsometers

Designed for the semiconductor industry allowing reliable in-line process control and high yield production.

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Large Area Metrology Systems

Designed for the display industry, capable to handle up to 7th generation display substrates.

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Software

DeltaPsi2 is a new generation of software based on a common GUI frame, and has been designed to provide intuitive and comprehensive user interaction with the system. The multitasking software provides the ultimate in versatility for use in ex-situ and in-situ configurations as well as the ability to drive fully automatic ellipsometers.

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