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Ellipsometry is an optical non destructive technique allowing
the accurate characterization of thin films, surface and interface.
It is capable of determining layer thickness from 1 Å to tens
of microns, optical constants, composition, anisotropy, crystallinity
and uniformity.
Spectroscopic
Ellipsometers |
Unique technologies providing the most sensitive,
accurate measurement along with advanced thin film characterization
capabilities.
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Laser
Ellipsometers |
Cost effective, upgradeable solution for simple metrology
applications.
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In-Situ
Ellipsometers |
High precision, high speed monitoring and control
of thin film deposition or etch processes.
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Fully
Automated Ellipsometers |
Designed for the semiconductor industry allowing
reliable in-line process control and high yield production.
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Large
Area Metrology Systems |
Designed for the display industry, capable to handle
up to 7th generation display substrates.
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Software |
DeltaPsi2 is a new generation of
software based on a common GUI frame, and has been designed
to provide intuitive and comprehensive user interaction
with the system. The multitasking software provides
the ultimate in versatility for use in ex-situ and in-situ
configurations as well as the ability to drive fully
automatic ellipsometers.
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