The
MultiCPM design concept is based on an open parallel architecture
consisting of a central supervisor control unit, and a
network of analytical substations. In a cluster tool configuration,
an instrumentation unit, with its own processor and hard
disk, is connected to each chamber of the tool and is
linked
to the MultiCPM supervisor by a local area network (LAN).
The supervisor performs simultaneously, all instrument
control
and acquisition functions via a windows type user interface
and communicates with the processing tool through a SECS
II or customised link. Support for almost all commercially
available etchers is available.
The MultiCPM is a modular instrumentation platform, incorporating
a supervisor station, and up to 16 remote sensors and their
associated controller unit. OES, UV and laser interferometry,
ellipsometry and electrostatic probing, as well as other
sensors can all be integrated into a single station to
provide
unparalleled comprehensive process control. The flexibility
of the system allows the customer to tailor a unique configuration
of analytical techniques, specific to the individual process
monitoring of each chamber.
Multi-Chamber Monitoring
The production of sub micron feature semiconductor devices
relies heavily on the use of cluster tools with several
chambers for the different etching or deposition steps.
Process reliability and yields are enhanced by closed loop
control, which requires the use of specific in situ diagnostic
techniques for accurate end point detection on each chamber.
The MultiCPM allows multiple endpoint detectors operating
on different chambers of a cluster tool to be controlled
via a single user interface. A SECS II link to the tool
allows information such as the current step and batch to
be obtained by the MultiCPM this allows the appropriate
step to be run and informative database management to be
performed.
Multi-Sensor Support
Research and development and set up of new processes often
requires several complementary diagnostic measurements.
The MultiCPM platform allows multiple sensors to be controlled
through a single user interface.
Main Features
