The
Plasmascope is an advanced plasma monitor and end point
detection system specially designed for process development
and small production units. It uses high resolution spectrograph
for simultaneous measurement from 190 to 850 nm allowing
handling multi-channel recording in real-time. Its compact
package incorporates an optical fibre input and provides
both easy measurement and easy installation advantages to
tailor the system capabilities to your experiment’s demands.
The instrument provides very high performance in terms of
accuracy and reliability, making it the ideal in-situ monitoring
solution for today’s shrinking geometries and complex multi-step
processes.
The integrated plasmacope software package has been designed
to process data simply and reliably via predefined recipes
while delivering broad functionality for advanced analysis
and reprocessing capabilities.
Key Features
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Advanced
algorithms for data acquisition and signal treatment.
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Multiple endpoint conditions, multiwavelengths.
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Easy recipe concept to define the measurement conditions
as well as the analytical methodology of signal processing.
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Predefined recipe for turnkey process operation.
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Integrated SQL database for data management and safe data
storage.
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High reprocessing capabilities for review and end point
optimisation allowing a minimum number of wafers for engineering.
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Advanced process statistics for long-term monitoring of
process and health chamber behaviour.
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Full connectivity to cluster tool & factory host via
integrated pass-through and process engineer desk.
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Open platform for easy integration of multi sensors.
