The
PQ Ruby tool has been specially designed for in-line
process control in IC production. Using a combination of
laser
ellipsometry and spectroscopic reflectometry the PQ Ruby
is capable of determining the thickness, optical refractive
index, absorption constants and reflectivity of films
up to 30 µm thick, with submonolayer sensitivity.
This thin-film metrology tool provides unique advantages
in
terms of automation, standardization, small footprint
and high throughput to suit advanced requirements of mass
production.
The PQ Ruby meets all of your thin film metrology requirements
by delivering robust, automatic and highly reliable data.
The PQ Ruby combined laser ellipsometer / reflectometer
provides a very cost effective solution for improving
fab productivity.
Integrated
Thin Film Metrology Tool for High Productivity
